Pre-moistened cleanroom wipes are essential for cleaning semiconductor equipment, offering superior contaminant removal while maintaining ESD safety. Saturated with high-purity solvents such as isopropyl alcohol or deionized water, these wipes efficiently eliminate dust, oils, and residues from delicate surfaces. Proper application involves selecting the correct wipe size, using gentle unidirectional strokes, and sequentially wiping heavily soiled areas to prevent particle redistribution. Regular use of pre-moistened wipes preserves equipment performance, protects sensitive components, and ensures compliance with strict cleanroom standards for semiconductor manufacturing.
Features:
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Pre-moistened with high-purity solvents for effective cleaning
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Lint-free, residue-free, and anti-static
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Gentle on sensitive semiconductor components
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Optimized for liquid absorption and contaminant removal
Application Scope:
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Semiconductor fabrication and processing equipment
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Cleanroom environments with strict particle control
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ESD-sensitive instruments and precision machinery
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Controlled workflows requiring high cleaning standards