Cleaning wipes are critical in semiconductor cleanrooms to maintain particle-free and ESD-safe environments. Proper techniques ensure effective contamination control and protect sensitive semiconductor components.

Key Features:

• Lint-Free: Prevents fiber shedding that could damage wafers or devices.

• High Absorbency: Quickly removes residues, oils, and moisture.

• Antistatic Properties: Reduces electrostatic discharge (ESD) risks.

• Durable: Resists tearing for thorough cleaning of critical areas.

Usage Techniques:

1. Unidirectional Wiping: Always wipe in one direction to avoid redepositing particles.

2. Single-Use: Dispose of each wipe after use to prevent cross-contamination.

3. Target High-Risk Areas: Focus on benches, tools, and sensitive equipment first.

4. Pre-Wetted Wipes: Use IPA or deionized water pre-moistened wipes for enhanced cleaning.

Application Range:

• Semiconductor Wafers: Cleaning surfaces before and after processing.

• Workstations: Maintaining particle-free benches and tool areas.

• Optical Components: Lenses and mirrors in semiconductor inspection equipment.

• Cleanroom Compliance: Supports Class 100–1000 standards for sensitive environments.