Anti-static cleanroom wipes play a crucial role in maintaining semiconductor equipment. These wipes are designed to be lint-free and possess anti-static properties, preventing electrostatic discharge (ESD) that could potentially damage sensitive semiconductor components. In semiconductor manufacturing and maintenance, these wipes are used to clean wafer surfaces, photomasks, photolithography equipment, and other precision tools. Their pre-saturated form with high-purity solvents ensures thorough cleaning without leaving residues. Proper wiping techniques, such as single-direction strokes and controlled pressure, are essential for removing dust, oils, and residues without harming delicate components. The use of these wipes in Class 100–1000 cleanrooms improves the overall equipment longevity and reliability.
Key Features:
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Anti-static properties to prevent ESD damage
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Lint-free for residue-free cleaning
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Pre-saturated with high-purity solvents for thorough cleaning
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Safe for delicate semiconductor equipment and components
Application Scope:
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Semiconductor manufacturing and maintenance
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Cleanroom environments (Class 100–1000)
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Wafer surfaces, photomasks, and photolithography equipment
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Precision tools and high-tech equipment maintenance