Semiconductor Equipment Cleaning with IPA

Isopropyl alcohol (IPA) wipes are essential for maintaining cleanliness and preventing contamination in semiconductor equipment. Pre-wetted, lint-free wipes efficiently remove dust, oils, flux residues, and microscopic contaminants from sensitive surfaces without scratching or damaging delicate components. Single-direction wiping with controlled pressure prevents particle redistribution, while anti-static properties minimize electrostatic discharge (ESD) risks. IPA’s rapid evaporation leaves no residue or streaks, making it ideal for cleaning metals, plastics, and electronic components. Implementing proper IPA wipe techniques enhances equipment reliability, reduces defect rates, and ensures compliance with Class 100–1000 cleanroom standards.

Key Features:

  • Pre-wetted with high-purity IPA for effective cleaning

  • Lint-free and anti-static to protect sensitive surfaces

  • Rapid evaporation prevents streaks and residue

  • Safe for metals, plastics, and semiconductor components

Application Scope:

  • Semiconductor fabrication and assembly equipment

  • PCB maintenance and electronics inspection zones

  • Optical and precision instruments in cleanrooms

  • Industrial and laboratory semiconductor devices

Posted in Dust-free wipes and tagged , , , .

Leave a Reply

Your email address will not be published. Required fields are marked *