High-density cleanroom wipes are designed for precise cleaning of semiconductor equipment, including wafers, photomasks, and assembly tools. Their tightly woven ultra-fine fibers efficiently remove dust, oils, and particulate contaminants without leaving lint or scratches. Compatible with high-purity solvents, these wipes ensure streak-free cleaning, protect sensitive surfaces, and maintain device performance. Ideal for Class 100–1000 cleanrooms, they enhance cleaning efficiency, support contamination control, and optimize semiconductor production workflows.
Features:
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Ultra-fine, high-density fibers for thorough contaminant removal
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Lint-free and non-abrasive for sensitive surfaces
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Excellent solvent absorption for streak-free cleaning
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Optimized for semiconductor cleanroom applications
Applications/Range:
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Semiconductor wafers and photomask cleaning
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Precision tools and equipment maintenance
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PCB and electronic component cleaning
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Controlled environment and cleanroom workflows