High-density cleanroom wipes provide superior cleaning performance in semiconductor laboratory environments. Their tightly woven, ultra-fine fibers efficiently remove dust, oils, flux residues, and microscopic contaminants from sensitive surfaces without leaving lint or scratches. Lint-free and anti-static properties prevent particle redistribution and electrostatic discharge (ESD), safeguarding delicate semiconductor components. Wipes can be used dry or pre-wetted with high-purity solvents such as isopropyl alcohol for enhanced cleaning effectiveness. Suitable for Class 100–1000 cleanrooms, high-density wipes improve cleaning efficiency, reduce defect rates, and support strict laboratory and semiconductor cleanliness standards, ensuring reliable experimentation and production outcomes.
Key Features:
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Ultra-fine, high-density fibers for thorough, scratch-free cleaning
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Lint-free and anti-static to protect sensitive semiconductor components
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Compatible with dry or solvent-assisted cleaning
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Efficient removal of dust, oils, and flux residues
Application Scope:
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Semiconductor laboratory equipment and surfaces
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PCB assembly and testing zones
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Cleanroom instrumentation and optical systems
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Precision electronic maintenance and repair