Anti-static cleanroom wipes play a critical role in maintaining the cleanliness and reliability of semiconductor manufacturing environments. These wipes are designed to effectively remove fine particles, oils, and residues from sensitive components without generating static electricity. Made from polyester or microfiber materials, anti-static wipes feature low particle release and excellent solvent compatibility, ensuring they do not contaminate wafers, photomasks, or other precision surfaces. Their use minimizes electrostatic discharge (ESD) risks that could damage delicate semiconductor circuits. Regular cleaning with these wipes enhances process stability, reduces defects, and extends equipment life.
Features:
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Excellent anti-static performance to prevent ESD damage
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Low particle generation and high absorbency
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Chemical and solvent resistance
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Soft, lint-free texture suitable for delicate surfaces
Application Scope:
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Wafer processing and lithography equipment
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Photomask and reticle cleaning
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Vacuum chamber and robotic arm maintenance
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Semiconductor assembly and packaging areas