Cleanroom wipes, particularly pre-moistened low-lint types, play a critical role in semiconductor laboratory cleaning processes. They efficiently remove dust, oils, flux residues, and other contaminants from delicate surfaces without generating particles. Proper usage involves selecting the appropriate wipe size, employing gentle unidirectional strokes, and using pre-moistened wipes with isopropyl alcohol or deionized water for heavily soiled areas. Integrating cleanroom wipes into standard cleaning workflows ensures consistent surface cleanliness, protects sensitive semiconductor devices from contamination and ESD damage, and maintains optimal performance and reliability of laboratory equipment.
Features:
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Lint-free, residue-free, and anti-static for sensitive surfaces
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Efficient removal of dust, oils, and flux residues
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Pre-moistened for consistent cleaning performance
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Safe for semiconductor devices, PCBs, and optical instruments
Application Scope:
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Semiconductor laboratory surfaces and equipment
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Cleanroom environments (Class 100–1000)
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PCB assemblies, wafers, and optical devices
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ESD-sensitive and precision instrumentation