Cleaning wipes are critical in semiconductor cleanrooms to maintain particle-free and ESD-safe environments. Proper techniques ensure effective contamination control and protect sensitive semiconductor components.
Key Features:
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Lint-Free: Prevents fiber shedding that could damage wafers or devices.
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High Absorbency: Quickly removes residues, oils, and moisture.
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Antistatic Properties: Reduces electrostatic discharge (ESD) risks.
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Durable: Resists tearing for thorough cleaning of critical areas.
Usage Techniques:
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Unidirectional Wiping: Always wipe in one direction to avoid redepositing particles.
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Single-Use: Dispose of each wipe after use to prevent cross-contamination.
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Target High-Risk Areas: Focus on benches, tools, and sensitive equipment first.
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Pre-Wetted Wipes: Use IPA or deionized water pre-moistened wipes for enhanced cleaning.
Application Range:
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Semiconductor Wafers: Cleaning surfaces before and after processing.
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Workstations: Maintaining particle-free benches and tool areas.
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Optical Components: Lenses and mirrors in semiconductor inspection equipment.
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Cleanroom Compliance: Supports Class 100–1000 standards for sensitive environments.